
"We are shipping the first High NA system and announced this in a social media post today," a spokesperson for ASML said. "It goes to Intel as planned and announced earlier."

EUV is absorbed by glass, necessitating the use of mirrors for focusing, for starters. Each mirror absorbs approximately 30% of the light, and in a typical system with 10 mirrors, only a small fraction of the original power reaches the mask.

“I want it to be a total surprise. Our employees will learn about it first, and then the rest of the world will hear about it through a press conference."
~Fujio Mitarai, Canon CEO

Dutch Trade Minister Liesje Schreinemacher has voiced her government's willingness to cooperate with the U.S. while emphasizing the need for a more European-centric strategy in addressing these trade restrictions.

Discover the shocking allegations of industrial espionage as a former ASML employee, accused of stealing valuable technology data, makes a mysterious move to join Huawei.

Chinese chip makers will still have access to essential ASML equipment for the next four months. Peter Wennink also pointed out that the new US restrictions are targeted at only a limited number of Chinese fabs involved in advanced semiconductor manufacturing, thereby excluding the vast majority of ASML's Chinese customers.

The smaller and more powerful chips that are made possible by EUV lithography will have a major impact on our lives. They will make our devices faster, more energy-efficient, and more capable. They will also enable new applications that are not possible today, such as artificial intelligence and augmented reality.