Why China’s Semiconductor Industry(Huawei chips) Faces a 15-Year Lag: Insights from ASML’s CEO
“By banning the export of EUV, China will lag 10 to 15 years behind the West. That really has an effect.”
Tag EUV
What are 4 Major Issues with EUV: IBM at IEDM 2023
IBM's update highlighted a significant reduction of over 50% in the depth of focus for High-NA EUV. This reduction necessitates precise control over resist thickness and planarity, requiring them to be maintained below 30 nm.
What are 3 Major challenges in EUV Lithography ?
EUV is absorbed by glass, necessitating the use of mirrors for focusing, for starters. Each mirror absorbs approximately 30% of the light, and in a typical system with 10 mirrors, only a small fraction of the original power reaches the mask.
Canon Launches Lithography Machine to Rival ASML, Could Help China Circumvent EUV Ban
Importing EUV machines, currently the primary and dependable means for producing 5nm chips and smaller, into China is restricted due to trade sanctions. Canon offers a novel approach to China's problem
