New Japanese EUV lithography method offers a simpler, more efficient, and potentially more cost-effective approach
Operating on the 100 gigahertz (GHz) frequency for indoor use and the 300 GHz band for outdoor applications, this prototype highlights the potential for unparalleled connectivity speeds.
The factory aims to produce lithography materials for chipmaking. Shin-Etsu plans to complete the first phase of investment by 2026 to meet increasing customer demand and expand its production base.
Rapidus plans to mass produce 2-nanometer chips from 2027, competing with industry leaders TSMC and Samsung Electronics.
While the US Commerce Department raised the issue during a meeting in Tokyo, both Japanese and Dutch officials are skeptical about the proposed changes.
With the direct creation of over 3,400 high-tech professional jobs, JASM's establishment is poised to catalyze economic growth and innovation
It's notable how Taiwan( 77), despite having fewer fabs than Japan (102), holds a significant influence in the industry due to the TSMC's dominance in advanced semiconductor manufacturing.
This technology primarily involves the manipulation, transmission, and detection of light to perform tasks such as data communication, signal processing, and sensing within integrated circuits.
Typically, such subsidies cover about one-third of the project cost. Therefore, the additional subsidy of 900 billion yen(~6B$) represents a substantial financial contribution, with the government anticipated to shoulder more than one-third of the total project cost.
The Japanese government's subsidy will help Micron to install new lithography equipment at its Hiroshima plant, which will allow it to produce more advanced DRAM chips. This is a significant development for the global semiconductor industry, as it shows that governments are willing to invest in domestic chip production.