Tag VLSI

TSMC to Unveil Next-Gen Transistor Using Ultra Thin MoS2 at IEDM 2023

TSMC IEDM MoS2

One of the key components of this advancement is Atomic Layer Deposition (ALD), a technique that enables precise and uniform synthesis of MoS₂. The choice of precursors, such as Mo (CO)₆ and H₂S, plays a critical role in achieving optimal deposition characteristics. With these advances, researchers have successfully scaled up the process to achieve uniform film growth on large 300 mm SiO₂/Si wafers, offering industry-level manufacturing potential.

For Semiconductor SAGA : Whether you’re a tech enthusiast, an industry insider, or just curious, this book breaks down complex concepts into simple, engaging terms that anyone can understand.The Semiconductor Saga is more than just educational—it’s downright thrilling!

For Chip Packaging : This Book is designed as an introductory guide tailored to policymakers, investors, companies, and students—key stakeholders who play a vital role in the growth and evolution of this fascinating field.